Our Reticles
Reticles are essential components in photolithography systems and offer several benefits, particularly in advanced exposure systems that can accommodate different patterns, making them suitable for a wide range of applications in semiconductor and microelectronics industries.
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As your Trusted Micro-Nano Engineering Partner, we provide a diverse range of customised reticles, including Nikon, Canon, ASML, and 1X Ultratech systems for your very needs.
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With our one-stop service from semiconductor design fabrication to contract manufacturing and inspection, we are committed to delivering you with the exact materials you need.
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Nikon
Nikon’s photolithography systems, such as steppers and scanners, use reticles to accurately transfer patterns onto semiconductor wafers, and are used for a wide range of semiconductor fabrication processes, including logic devices, memory devices and image sensors that require high resolution and precision.
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We can customise reticles for Nikon systems according to your preferred specifications, including Minimum Critical Dimension (CD), material size and thickness.
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Canon
Canon’s systems are known for their high-quality optics and reticles are used in various semiconductor manufacturing applications, including advanced logic and memory devices to project patterns onto semiconductor wafers.
We can customise reticles for Canon systems according to your preferred specifications, including Minimum Critical Dimension (CD), material size and thickness.
ASML
ASML specializes in advanced photolithography systems, especially extreme ultraviolet (EUV) lithography machines, that make use of reticles to create high-performance CPUs and memory chips for advanced semiconductor devices.
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We can customise reticles for ASML systems according to your preferred specifications, including Minimum Critical Dimension (CD), material size and thickness.
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1X Ultratech
1X Ultratech produces laser photolithography systems used for various microfabrication applications that make use of reticles for specialised microfabrication processes beyond semiconductor wafers, including MEMS (Micro-Electro-Mechanical Systems) devices, micro-optics, and specialized sensors.
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We can customise reticles for 1X Ultratech systems according to your preferred specifications, including Minimum Critical Dimension (CD), material size and thickness.